Abstract:Single LiNbO3 (LNO) crystals are widely utilized in surface acoustic wave devices, optoelectronic devices, and novel ferroelectric memory devices due to their remarkable electro-optic and piezoelectric properties, and high saturation and remnant polarizations. However, challenges remain regarding their nanofabrication that hinder their applications. The prevailing etching techniques for LNO encompass dry etching, wet etching, and focused-ion-beam etching, each having distinct merits and demerits. Achieving higher etching rates and improved sidewall angles presents a challenge in LNO nanofabrication. Building upon the current etching researches, this study explores various etching methods using instruments capable of generating diverse plasma densities, such as dry etching in reactive ion etching (RIE) and inductively coupled plasma (ICP), proton exchange-enhanced etching, and wet chemical etching following high-temperature reduction treatment, as well as hybrid dry and wet etching. Ultimately, after employing RIE dry etching combined with wet etching, following a high-temperature reduction treatment, an etching rate of 10 nm/min and pretty 90° sidewall angles were achieved. Furthermore, high etching rates of 79 nm/min with steep sidewall angles of 83° were obtained using ICP dry etching. Additionally, using SiO2 masks, a high etching rate of 108 nm/min and an etching selectivity ratio of 0.86:1 were achieved. Distinct etching conditions yielded diverse yet exceptional results, providing multiple processing paths of etching for the versatile application of LNO.

Preparation of LiNbO3 Thin Film on Insulator for High-Performance Lithium Niobate Devices

Single-crystalline LiNbO3 Integrated Onto Si-based Substrates Via Ar Plasma-Activated Low-Temperature Direct Bonding

Integration Technology for Wafer-Level LiNbO3 Single-Crystal Thin Film on Silicon by Polyimide Adhesive Bonding and Chemical Mechanical Polishing

LiNbO3 Crystals: from Bulk to Film

Thinning of Lithium Niobate Wafers with a Novel Designed Lapping Tool and Measurements

Optical and Structural investigations of LiNbO3 thin films by PLD

Pulsed Laser Deposition of Optical Waveguiding LiNbO 3 Films on SiO 2 Substrate

LiNbO3 Thin Films through a Sol–Gel/Spin-Coating Approach Using a Novel Heterobimetallic Lithium–Niobium Precursor

Optical Waveguide Properties of LiNbO3 Thin Films on Silicon Substrates

GROWTH AND CHARACTERIZATION OF C-ORIENTED LiNbO3 THIN FILMS ON Si (100) BY PLD

Low-loss Lithium Niobate on Insulator (LNOI) Waveguides of a 10 cm-length and a Sub-nanometer Surface Roughness

LOW-TEMPERATURE PREPARATION OF NANO-CRYSTALLINE LITHIUM NIOBATE POWDERS BY THE POLYMERIC PRECURSOR METHOD

Advanced Etching Techniques of LiNbO3 Nanodevices

Long Low-Loss-Litium Niobate on Insulator Waveguides with Sub-Nanometer Surface Roughness

GROWTH AND CHARACTERIZATION OF C-ORIENTED <font>LiNbO</font><sub>3</sub> THIN FILMS ON Si (100) BY PLD

Highly C-axis oriented LiNbO3 thin film on amorphous SiO2 buffer layer and its growth mechanism

In-situ Poling of Lithium Niobate Films on Silicon Wafer by Applying a Low Electric Field During Pulsed Laser Deposition

(012) Textured LiNbO3 Waveguiding Films Grown on SiO2 by Pulsed Laser Deposition Technique

The role of SiO2 buffer layer in the growth of highly textured LiNbO3 thin film upon SiO2/Si by pulsed laser deposition

Homo-epitaxial growth of LiNbO3 thin films by Pulsed Laser deposition

Microstructure of LiNbO3 Thin Films Grown on Silicon Substrates by Pulsed Laser Deposition