Erratum: ‘‘proximity Effect Correction Data Processing System for Electron Beam Lithography’’ [J. Vac. Sci. Technol. B 10, 133 (1992)]

Wen‐Zhong Lu,Jingxin X. Tao,N. Gu
DOI: https://doi.org/10.1116/1.586520
1993-01-01
Abstract:Views Icon Views Article contents Figures & tables Video Audio Supplementary Data Peer Review Share Icon Share Twitter Facebook Reddit LinkedIn Tools Icon Tools Reprints and Permissions Cite Icon Cite Search Site Citation W. Lu, J. X. Tao, N. Gu; Erratum: ‘‘Proximity effect correction data processing system for electron beam lithography’’ [J. Vac. Sci. Technol. B 10, 133 (1992)]. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena 1 September 1993; 11 (5): 1906–1907. https://doi.org/10.1116/1.586520 Download citation file: Ris (Zotero) Reference Manager EasyBib Bookends Mendeley Papers EndNote RefWorks BibTex toolbar search Search Dropdown Menu toolbar search search input Search input auto suggest filter your search All ContentAVS: Science & Technology of Materials Interfaces and ProcessingJournal of Vacuum Science & Technology B Search Advanced Search |Citation Search
What problem does this paper attempt to address?