Erratum: Zhang, C. et al., The Effect of Substrate Biasing during DC Magnetron Sputtering on the Quality of VO2 Thin Films and Their Insulator–Metal Transition Behavior. Materials 2019, 12, 2160

Chunzi Zhang,Ozan Gunes,Yuanshi Li,Xiaoyu Cui,Masoud Mohammadtaheri,Shi-Jie Wen,Rick Wong,Qiaoqin Yang,Safa Kasap
DOI: https://doi.org/10.3390/ma13225132
IF: 3.4
2020-11-13
Materials
Abstract:The authors would like to correct a typographical error in their paper [...]
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,metallurgy & metallurgical engineering
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