A Novel Duplex Low-temperature Chromizing Process at 500Oc

Huiliang Cao,WU Cui-lan,Jiangwen Liu,Chengping Luo,Zou Gan-feng
2009-01-01
Journal of Material Science and Technology
Abstract:a duplex chromizing process which consists of a precursor plasma nitriding, and afollowed salt bath thermoreactive deposition and diffusion (TRD) chromizing process. CrN layer with a thindiffusion layer underneath was formed. The duplex chromizing process was studied by optical microscopy(OM), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction(XRD), and transmission electron microscopy (TEM). It was found that the chromizing speed at 500
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