Contact Resistance Asymmetry of Amorphous Indium–gallium–zinc–oxide Thin-Film Transistors by Scanning Kelvin Probe Microscopy

Changyan Wu,Yunfeng Chen,Hai Lu,Xiaoming Huang,Fangfang Ren,Dunjun Chen,Rong Zhang,Yi Zheng
DOI: https://doi.org/10.1088/1674-1056/25/5/057306
2016-01-01
Abstract:In this work, a method based on scanning Kelvin probe microscopy is proposed to separately extract source/drain (S/D) series resistance in operating amorphous indium–gallium–zinc–oxide (a-IGZO) thin-film transistors. The asymmetry behavior of S/D contact resistance is deduced and the underlying physics is discussed. The present results suggest that the asymmetry of S/D contact resistance is caused by the difference in bias conditions of the Schottky-like junction at the contact interface induced by the parasitic reaction between contact metal and a-IGZO. The overall contact resistance should be determined by both the bulk channel resistance of the contact region and the interface properties of the metal-semiconductor junction.
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