Effects of Cr, Y and Nb Ion Implantation on Oxidation Behavior of Γ-Tial at 1000℃

Zhu Xiaopeng,Zilong Tang
2001-01-01
Abstract:A γ-TiAl intermetallic compound was implanted with Cr, Y and Nb ions respectively to a dose of 1×10 17 cm -2 at an ion energy of 50-60keV by using a MEVVA ion source. Cyclic oxidation tests were performed on this compound at an oxidation temperature of 1000℃ in air. It was found that Cr or Y ion implantation slightly affects the oxidation behavior of γ-TiAl at 1000 ℃ during the whole testing period up to 200h. The Nb ion implantation significantly improved the oxidation resistance of γ-TiAl in the initial stage of oxidation, but this improvement gradually decreased when the oxidation time was increased to more than 100h. By adding the same element, alloying and ion implantation have different effects on the oxidation resistance of γ-TiAl due to different characteristics resulted from these two processes. The modified surface of γ-TiAl by ion implantation has limited effects on improving its oxidation resistance during long term at high temperatures.
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