TCAD Modeling of Temperature-Dependent Reverse Recovery Characteristics of 1.2-Kv SiC MOSFETs’ Body Diode

Zhe Xue,Mengyu Zhu,Hongchang Cui,Fengtao Yang,Yunqing Pei,Laili Wang
DOI: https://doi.org/10.1109/ecce53617.2023.10362165
2023-01-01
Abstract:The reverse recovery characteristics of 1.2-kV SiC MOSFETs’ body diode have been measured based on the hightemperature experimental platform in a wide range of 25 °C to 400 °C. In order to explore the physical mechanisms inside the device, 2D TCAD numerical simulations have been carried out and the device structure and physical models were calibrated. A new model of carrier lifetime that considers the sharp increase near 225 °C was developed. Simulation results verified that there are two reasons leading to the mutation phenomenon of reverse recovery characteristics at high temperature: 1) the temperature dependence of carrier lifetime and 2) the influence of traps in the P + shielding region. It was also observed that the capacitive charge dominates the reverse recovery charge from 25 °C to 275 °C and the drift charge shows more contributions from 325 °C to 400 °C.
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