An Analysis of the X-Ray Linear Dichroism Spectrum for NiO Thin Films Grown on Vicinal Ag(001)

Yizheng Wu
2008-01-01
Abstract:An analysis of the x-ray linear dichroism spectrum for NiO thin films grown on vicinal Ag(001) Y. Z. Wu 1,2 , Y. Zhao 3 , E. Arenholz 4 , A. T. Young 4 , and B. Sinkovic 3 , Z. Q. Qiu 2 , Surface Physics Laboratory and Department of Physics, Fudan University, Shanghai 200433, P. R. China Department of Physics, University of California at Berkeley, Berkeley CA 94720 Department of Physics, University of Connecticut, Storrs, CT 06269 Advanced Light Source, Lawrence Berkeley National Lab., Berkeley, CA 94720 Antiferromagnetic (AFM) NiO thin films are grown epitaxially on vicinal Ag(118) substrate and investigated by x-ray linear dichroism (XLD). We find that the NiO AFM spin exhibits an in-plane spin reorientation transition from parallel to perpendicular to the step edges with increasing the NiO film thickness. In addition to the conventional L 2 adsorption edge, x-ray linear dichroism (XLD) effect at the Ni L 3 adsorption edge is also measured and analysized. energy shift of the L 3 peak. The result identifies a small Temperature-dependent measurement confirms that the observed XLD effect in this system at the normal incidence of the x-rays originates entirely from the NiO magnetic ordering.
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