Influence of the Different Substrates on the Structure and Properties of Pb(Zr_(0.8)Ti_(0.20))O_3 Thin Films Prepared by RF Sputtering

Jianguo Zhu
2005-01-01
Abstract:Pb(Zr_ 0.8 Ti_ 0.2 )O_3 thin films were prepared on the different substrates of low resistance Si wafer, SiO_2/Si and Pt/Ti/SiO_2/Si by RF sputtering. The crystalline propertyies, microstructure, and electrical properties of PZT thin films were investigated by X-ray diffraction(XRD), scanning electron microscope(SEM) and other analysis tools .The experiment results indicate that the microstructure and electrical properties of sputtered PZT films are highly dependent on the different substrates. The PZT thin films were fabricated on Pt/Ti/SiO_2/Si substrates were smooth and crack-free, X-ray analysis results showed that the films were pure perovskite phase after annealing at 600℃ for 60 min. The electric measurement results shows that the PZT thin films have good dielectric properties.
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