PZT FERROELECTRIC THIN FILMS PREPARED BY SPUTTERING AT PURE OXYGEN AND HIGH PRESSURE

ZENG Yike,JIANG Shenglin,DENG Chuanyi,CHEN Shi,LIU Meidong
DOI: https://doi.org/10.3321/j.issn:0454-5648.2005.03.020
2005-01-01
Abstract:Lead zirconate titanate (PZT) ferroelectric thin films were deposited in situ on Pb(Zr_(0.55) Ti_(0.45))O_(3) ceramic target at pure O_(2) and high pressure sputtering conditions. 5.0%(in mass) excessive Pb_(3)O_(4) was added to the ceramic target materials for preventing Pb element volatilize during sintering and sputtering processes. Experimental results indicate that proportion of the segregation of n(Pb)/n(Zr+Ti) decreases with the increase of the difference for space ranging from the target to the substrate, when optimum ranging of the distance of the target to the substrate is definite. X-ray diffraction analysis shows that there are PbO and solid solution TZO(titanium zirconium oxides) phases in PZT ferroelectric thin films, but no hydrochlore phase. The electric property measurement indicates that the hysteresis loops are symmetry, and residue polarization P_(r) reaches to about (14.1 μc/cm~(2)), while coercive field strength E_(c) is small, which is close to that of Pb(Zr_(0.55)Ti_(0.45))O_(3) ceramic target.
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