An Etching-Free Method for Patterning Carbon Nanotube Films Enabled by Universal Wettability Modulation

Rui Qiu,Qinqi Ren,Qi Liu,Lei Lu,Min Zhang
DOI: https://doi.org/10.1109/nmdc46933.2022.10052161
2022-01-01
Abstract:Non-destructive patterning of low-dimensional materials has always been a challenge. An etching-free patterning method for high-density carbon nanotube (CNT) network has been proposed based on a wettability modulation method. By adopting this method, we have realized high-resolution patterns of CNT films, which have been uniformly formed on the wetting regions with precise boundaries. A flexible thin-film transistor array has been further realized, which shows excellent electrical performance with on/off current ratio of 104 as well as subthreshold swing of 280 mV/dec. This high-efficiency, high-resolution, and etching-free patterning approach of CNTs holds great promise for numerous potential applications in flexible and stretchable electronics and provides general solution for the low-temperature low-dimension material fabrications of advanced electronics.
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