Point-defect improved photogalvanic effect in Janus WSSe monolayer

Hong Li,YunFeng Zhang,Wei Du,Jiang Da,Shiyu Ji,Shuai Sun,Fengbin Liu,Jing Lu
DOI: https://doi.org/10.1016/j.mtcomm.2022.104680
IF: 3.8
2022-01-01
Materials Today Communications
Abstract:Photogalvanic effect (PGE) occurs under polarization irradiation in a material without space inversion symmetry, yet the generated photocurrent is generally small. By imposing various species of point defects, we have studied the PGE in Janus WSSe using the quantum transport simulation. All the photocurrents show cosine dependence with the linear polarization angle when the photodetectors are built along the armchair direction. Effective improvements in photocurrent are detected with the maximum photocurrents of 4.55-6.33 a02/photon compared with 0.25 a02/photon in the pure one. The key cause for the improvement is the reduction of symmetry from C3 V to CS by the point defect. High polarization sensitivity is also achieved where the maximum extinction ratio of 1.37 x 104 is obtained in the Janus WSSe with one In substituted W.
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