Ultra-Low Noise Schottky Junction Tri-Gate Silicon Nanowire FET on Bonded Silicon-on-Insulator Substrate

Yingtao Yu,Si Chen,Qitao Hu,Paul Solomon,Zhen Zhang
DOI: https://doi.org/10.1109/led.2021.3057285
IF: 4.8157
2021-04-01
IEEE Electron Device Letters
Abstract:Random trapping and detrapping of charged carriers in the vicinity of gate oxide/Si interface has for long been considered as the dominant noise source in Si nanowire (SiNW) FET-based biochemical sensors. Here we extend our previous work presenting a Schottky junction tri-gate SiNWFETs (SJGFET) fabricated on a bonded silicon-on-insulator (SOI) substrate, aiming for ultra-low device noise generation. The SJGFET exhibits near-ideal gate coupling efficiency with a subthreshold swing of ~66 mV/dec. Its gate-referred voltage noise, $S_{text {vg}}$ , are ${1.2}times {10}^{-{10}}$ and ${1.1}times {10}^{-{11}},,text {V}^{{2}},,mu text{m}^{{2}}$ /Hz at 1 and 10 Hz, respectively. These $S_{text {vg}}$ values are significantly lower than that of previously reported FET-based sensors. More importantly, $S_{text {vg}}$ of the SJGFET are below the reported voltage noise generated by the oxide/electrolyte sensing interface. Using our SJGFET as the signal transducer can greatly relieve the concern of the adverse effect from the intrinsic device noise in biochemical sensing applications.
engineering, electrical & electronic
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