High Uniformity Ferroelectric MoS2 Nonvolatile Memory Array

Chunyang Li,Lu Li,Zhongyi Li,Fanqing Zhang,Lixin Dong,Jing Zhao
DOI: https://doi.org/10.1109/3m-nano56083.2022.9941686
2022-01-01
Abstract:Ferroelectric field effect transistor (FeFET) based on two-dimensional (2D) materials is centered great expectations for next-generation non-volatile memory devices owing to its excellent properties. In this paper, we fabricated monolayer $\text{MoS}_{2}$ FeFET devices array through coupling ferroelectric P(VDF - TrFE) as the dielectric layer. The $\text{MoS}_{2}$ FeFET device demonstrated excellent storage performance, including high on/off current ratios $\boldsymbol{(> 10^{6})}$ , a broad memory window (~15 V), long endurance (>200 cycles), and retention time (>1000 s). In additional, attributed to the chemical vapor deposition (CVD) synthesis of large-scale uniform Mos2,the devices array shows consistent characteristics, which suggest huge potential integrated circuit applications in the future.
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