Fabrication of the porous silicon though a self-assembled porous alumina template

Zeping Li,Zhimou Xu,Zhichao Ma,Xinghui Wu

DOI: https://doi.org/10.1364/oedi.2015.jw3a.48

2015-01-01

Abstract:We present the fabrication of porous silicon through a self-assembled porous alumina template(PAT) directly grown on the Si substrate. SEM and UV-vis spectrometer were used to characterize the morphology, size distribution and the reflectivity performance.

What problem does this paper attempt to address?

Fabrication of the Similar Porous Alumina Silicon Template for Soft UV Nanoimprint Lithography

Tangyou Sun,Zhimou Xu,Wenning Zhao,Xinghui Wu,Sisi Liu,Zheng Zhang,Shuangbao Wang,Wen Liu,Shiyuan Liu,Jing Peng

DOI: https://doi.org/10.1016/j.apsusc.2013.03.098

IF: 6.7

2013-01-01

Applied Surface Science

Abstract:High density honeycombed nanostructures of porous alumina template (PAT) have been widely used to the fabrication of various electronic, optoelectronic, magnetic, and energy storage devices. However, patterning structures at sub-100 nm feature size with large area and low cost is of great importance and hardness on which semiconductor manufacture technology depends. In this paper, soft UV nanoimprint lithography (SUNIL) by using PAT as the initial mold is studied in detail. The results reveal a significant incompatibility between these two candidates. The native nonflatness of the PAT surface is about 100 nm in the range of 2-5 mu m. Resist detaches from the substrate because of the mold deformation in the nonflat SUNIL. A two-inch similar porous alumina silicon (Si) template with nanopore size of 50-100 nm is fabricated. I-t curve conducted anodization and subsequent inductive coupled plasma (ICP) dry etching are applied to ensure the uniformity of the fabricated template. The surface flatness of the similar porous alumina Si template is the same as the polished Si wafer, which perfectly matches NIL. (c) 2013 Elsevier B.V. All rights reserved.
Preparation of Si Nanocrystals Using Anodic Porous Alumina Template Formed on Silicon Substrate

JH Wu,L Pu,JP Zhou,YF Mei,JM Zhu,XM Bao

DOI: https://doi.org/10.1088/0256-307x/17/6/024

2000-01-01

Chinese Physics Letters

Abstract:A novel technique to extend template application of anodic porous alumina to Si has been reported. First, porous alumina template about 400 nm thick was prepared on silicon substrate by anodizing thin aluminum film with high purity of 99.99% in 15 wt.% sulfuric acid under a constant voltage of 20 V and at an electrolyte temperature of 5°C. Then, amorphous Si layer approximately 50 nm in thickness was deposited onto the surface of template by using electron beam evaporation technique followed by an Xe ion beam bombardment, upon which as-coated Si layer at the pore mouth could be removed into pores smoothly. Three runs were performed by repeating above process of deposition and post bombardment. Finally, samples were annealed at 800°C for 30 min in nitrogen. Transmission electron microscopy and x-ray diffraction analysis reveal Si nanocrystals with a size of 15-20 nm being formed in the pores of template.
Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Bo Yan,Hoa T. M. Pham,Yue Ma,Yan Zhuang,Pasqualina M. Sarro

DOI: https://doi.org/10.1063/1.2767768

IF: 4

2007-01-01

Applied Physics Letters

Abstract:The authors demonstrate a method for the fabrication of in situ ultrathin porous anodic aluminum oxide layers (aspect ratio<2:1) on Si, which can be directly used as templates for nanodot preparation and for pattern transfer. The regular shape of the aluminum oxide pores is maintained even when the thickness of the aluminum oxide template is reduced to 50nm. By using these in situ ultrathin templates as lift-off masks, the authors successfully prepared a BaxSr1−xTiO3 nanodot array on Si surface. Furthermore, these nanotemplates are employed as lithographic masks to transfer the nanopattern into the silicon substrate.
Preparation of Porous Silicon Templates in Two Steps of Au-Assisted Chemical Etching

Hui Zheng,Liang Zheng,Mangui Han,Huibin Qin

DOI: https://doi.org/10.1166/jnn.2016.12366

2016-01-01

Journal of Nanoscience and Nanotechnology

Abstract:Porous silicon templates have been prepared by the metal-assisted chemical etching approach with gold (Au) nanoparticles as the catalyst. The Au nanoparticles of 30 nm in mean diameter and a distance of 100 nm between each other were arranged on the surface of Si substrate through the polystyrene (510000)-block-poly(2-vinylpyridine) (31000) (PS510000-b-P2VP(31000)) diblock copolymer. The effects of concentration of HF and etching temperature on the morphologies of the obtained nanopores have been investigated. It was found that the morphology of porous silicon can be tailored by adjusting the concentration of HF and etching temperature. Subsequently, porous silicon templates possessing pores with 500 nm in mean diameter and a 500 nm distance between the pores have been successfully fabricated in two etching steps. The porous silicon templates are believed to be potentially employed for fabrication nanowires (nanotubes) devices compatible with semiconducting industries.
Porous Silicon Templates Prepared by Cu-Assisted Chemical Etching

Hui Zheng,Mangui Han,Peng Zheng,Liang Zheng,Huibin Qin,Longjiang Deng

DOI: https://doi.org/10.1016/j.matlet.2013.12.093

IF: 3

2014-01-01

Materials Letters

Abstract:Porous silicon templates have been prepared by the metal-assisted chemical etching approach with optimized (HF/H2O2) solutions and Cu nanoparticles as the catalyst agents. The effects of metallization time and the concentration of Cu ions on the surface density of Cu nanoparticles on silicon templates have been studied. Besides, the effects of illumination and the composition of etching solution on the morphologies of the obtained nanopores have been investigated. It is found that uniform, isolated and nearly spherical Cu nanoparticles on the silicon surface can be obtained with the metallization processes containing 0.15mM copper nitrate and 25ml HF at room temperature for 15s. Subsequently, the porous silicon templates containing uniform pores with a mean diameter of 1.8μm have been successfully fabricated under an optimized etching process. The porous silicon templates are believed to be potentially employed for fabrication nanowires (nanotubes) devices compatible with semiconducting industries.
Al-assisted Anodic Etched Porous Silicon

Yue Zhao,Dongsheng Li,Deren Yang

DOI: https://doi.org/10.1007/s10853-006-0267-5

IF: 4.5

2006-01-01

Journal of Materials Science

Abstract:The photoluminescence (PL) properties and the surface morphologies of the porous silicon (PS) prepared from the wafers whose front sides were coated with or without Al film were studied. Furthermore, the Fourier Transforms Infrared (FTIR) and the Raman spectra were carried out. By introducing the Al film onto the front side of the wafer before the anodic etching, the surface morphology of the PS was quite different from that of conventional PS, which can be explained by the formation mechanism of the PS. The different PL properties of the PS may be attributed to the discrepancy in the structural configuration of the samples.
A Template-Based Method for Preparing Ordered Porous Silicon

Xing Wang,Ying Wu,Xiaowei Liu,Jianyong Chen,Congmian Zhen,Li Ma,Denglu Hou

DOI: https://doi.org/10.1007/s10934-015-0023-9

2015-01-01

Journal of Porous Materials

Abstract:A detailed study of a new method for preparing ordered porous silicon (PS) is reported. An Ag@SiO2 two-dimensional template was caused to self-assemble on a silicon surface using the vertical deposition method. Ordered PS was obtained by electrodeless etching of the Si wafer plus template in a mixed solution of HF and H2O2. The ordered PS was characterized using Field Emission Scanning Electron Microscopy, Spectrofluorimetry and Fourier Transform Infrared Absorption Spectroscopy. The diameter of the nanopores is about 500 nm. And the thermal conductivities of the ordered PS were found to be reduced compared to bulk silicon and disordered PS, due to enhanced phonon scattering. Compared with disordered PS, the ordered PS has a lower specific surface area. Straight holes and columnar structure in the ordered PS result in high absorption when the wavelength is longer than 890 nm and a high transmittance in the test range of 400–4000 wavenumbers.
Fabrication and characterization of vertically aligned carbon nanotubes on silicon substrates using porous alumina nanotemplates.

Wenchong Hu,Liming Yuan,Zhi Chen,Dawei Gong,Kozo Saito

DOI: https://doi.org/10.1166/jnn.2002.104

2002-01-01

Journal of Nanoscience and Nanotechnology

Abstract:An ethylene-air laminar diffusion flame successfully provided silicon substrates of anodic aluminum oxide (AAO) template with vertically oriented well-aligned carbon nanotubes. Field emission scanning electron microscopy (SEM) showed that open-tipped carbon nanotubes consisting of tube elements with the same length and diameter uniformly coated the template. High-resolution transmission electron microscopy (TEM) analyses revealed these nanotubes to be multiwalled carbon nanotubes, some well graphitized. It was found that cobalt catalyst particles, but not the porous aluminum templates, helped the growth of carbon nanotubes through graphitization and bonding of carbon nanotubes to the silicon substrates.
Large-Scale Preparation of Uniform Nanopatterned Silicon Substrates by Inductively Coupled Plasma Etching Using Self-Assembled Anodic Alumina Masks

Ji-Li Tian,Gui-Gen Wang,Hua-Yu Zhang,Jie-Cai Han

DOI: https://doi.org/10.1149/2.0061606jss

IF: 2.2

2016-01-01

ECS Journal of Solid State Science and Technology

Abstract:Nanopatterned silicon substrate has potential applications in the optoelectronic fields. However, its preparation is often complex and costly. In this paper, self-assembled anodic aluminum oxide (AAO) film masks on silicon substrates were deposited by a simple and feasible method, which was based on the direct anodization of sputtered Al film instead of previous reported Al/SiO2 or Al/Ti/SiO2 films. With the as-deposited AAO film masks other than common freestanding AAO templates, nanopatterned silicon substrates were finally obtained using two-step inductively coupled plasma (ICP) etching. The experimental results show that the pore arrangement of the AAO film has been successfully transferred to the silicon substrates after the ICP etching. The average diameter, wall thickness and depth for the as-obtained silicon nanopore arrays are approximately 65 nm, 40 nm, and 260 nm, respectively. It is believed that the above-proposed method has the potential for the fabrication of large-scale and uniform sub-100 nm nanopatterned silicon substrates. (C) 2016 The Electrochemical Society. All rights reserved.
Anodizing process of Al films on Si substrates for forming alumina templates with short-distance ordered 25 nm nanopores

Y.F. Mei,X.L. Wu,T. Qiu,X.F. Shao,G.G. Siu,Paul K. Chu

DOI: https://doi.org/10.1016/j.tsf.2005.06.044

IF: 2.1

2005-01-01

Thin Solid Films

Abstract:Porous alumina templates with short-distance ordered 25 nm nanopores were fabricated by controlling anodizing progress of Al films on Si substrates in sulfuric acid solution. The ordering of nanopore arrangement with a hexagonal symmetry was found to be closely related to thickness of the deposited Al film, growth temperature, applied voltage, and solution concentration. These parameters were explored in detail and proper experimental conditions were obtained to be 0.44 μm, 5 °C, 20 V, and 15 wt.% for the formation of a relatively ordered nanopore array. Anodizing progress of the Al film was monitored through the current–time (I–t) curve. Infrared transmittance spectral characterization and microstructural observations disclose that a SiO2 island array has been formed on the surface of Si substrate under our experimental conditions. This kind of SiO2 island array can be expected to have applications in nanoelectronics and optoelectronics.
A novel method of fabricating porous silicon material: ultrasonically enhanced anodic electrochemical etching

Y. Liu,Z.H. Xiong,Y. Liu,S.H. Xu,X.B. Liu,X.M. Ding,X.Y. Hou

DOI: https://doi.org/10.1016/S0038-1098(03)00489-7

IF: 1.934

2003-01-01

Solid State Communications

Abstract:Ultrasonically enhanced anodic electrochemical etching is developed to fabricate luminescent porous silicon (PS) material. The samples prepared by the new etching method exhibit superior characteristics to those prepared by conventional direct current etching. By applying ultrasonically enhanced etching, PS microcavities with much higher quality factors can be fabricated. The improved quality induced by ultrasonic etching can be ascribed to increased rates of escape of hydrogen bubbles and other etched chemical species from the porous silicon pillars' surface. This process will cause the reaction between the etchant and the silicon wafer to proceed more rapidly along the vertical direction in the silicon pores than laterally.
Large Area Assembly of Patterned Nanoparticles by a Polydimethylsiloxane Template

Xiangdong Ye,Anjiang Cai,Jinyou Shao,Xiaojun Wu,Xiaoguang Ruan,Xuefeng Zhang

DOI: https://doi.org/10.1007/s40843-015-0096-4

2015-01-01

Science China Materials

Abstract:A technique in which a polydimethylsiloxane (PDMS) template is used to assemble silicon oxide nanoparticles is proposed herein. The PDMS substrate was first constructed in a series of casting steps and a copper mask was then made with a laser marking system. Silicon oxide nanoparticles were generated by a modified Stober method. A PDMS substrate covered by the copper mask was then coated with a metal Au layer via sputtering to form the PDMS template. Finally, the silicon oxide nanoparticles were spin-coated on the PDMS template. Because the PDMS template consists of highly hydrophobic PDMS and less hydrophilic Au patterns, the nanoparticles undergo a dual dewetting process on the PDMS template to form an annular distribution around the borders of the Au patterns.
Long-Range-Ordered Ag Nanodot Arrays Grown on Gaas Substrate Using Nanoporous Alumina Mask

Wen Liu,Xiaodong Wang,Rui Xu,Xiaofeng Wang,Kaifang Cheng,Huili Ma,Fuhua Yang,Jinmin Li

DOI: https://doi.org/10.1016/j.mssp.2012.05.008

IF: 4.1

2013-01-01

Materials Science in Semiconductor Processing

Abstract:With more and more attention given to the plasmonic nanostructures enhancing light trapping of solar cells, the fabrication of metal nanostructures becomes more and more important. In this work, we fabricated porous anodic alumina on SiO2/GaAs substrate and obtained periodic Ag nanodots with hemispherical shape by electron beam evaporation. During the experiments, it was found that the properties of barrier layers of porous anodic alumina fabricated on SiO2/GaAs and SiO2/Si substrates after pore-widening are different. The through-hole porous anodic alumina film on SiO2/GaAs substrate cannot be obtained after a long pore-widening process. The additional Ar ion bombardment against the samples was needed in our experiments to get the through-hole porous anodic alumina films on SiO2/GaAs substrate.
Macroporous silicon templated from silicon nanocrystallite and functionalized SiH reactive group for grafting organic monolayer

Dongjie Guo,Jing Wang,Wei Tan,Shou–Jun Xiao,Zhen-Dong Dai

DOI: https://doi.org/10.1016/j.jcis.2009.04.030

IF: 9.9

2009-01-01

Journal of Colloid and Interface Science

Abstract:This paper reports the development of a new fabrication process for highly porous and highly functional macroporous silicon (m-PSi). This new fabrication process involves two steps of electrochemical etching and one step of sonication detachment, and it uses silicon nanocrystallites as a template to form a honeycomb-like macroporous structure. The surface fabricated by this process has been characterized in comparison with the m-PSi surface fabricated by a one-step etching process. Scanning electron microscopy (SEM) images show that both m-PSi surfaces have nearly similar pore diameters (1-2 microm), but their porous microstructures are very different: the surface fabricated by two-step etching exhibits a smooth and shallow pore structure, while the other surface exhibits a rough and deep pore structure. Fourier transform infrared spectroscopy (FTIR) analyses reveal that the former is functionalized with a reactive Si-H group, while the latter is functionalized with a stable Si-O-Si group. To evaluate the Si-H reactive group, an allyl polyethylene glycol (PEG) is employed to modify the surface through hydrosilylation. SEM, FTIR, X-ray photoelectron spectroscopy, and water contact angle measurements are used to characterize the PEG-grafted m-PSi surface. PEG-grafted m-PSi substrates may have wide applications in biosensors, chemosensors, and biochips.
Novel Technique for Preparation of Porous Silicon

QW Chen,XJ Li,JS Zhu,YH Zhang

1998-01-01

Progress in Natural Science

Abstract:Porous silicon （PS） was prepared by hydrothermal treatment of silicon in LiF-containing nitric acid solution Scanning tunneling microscope （STM） studies show that the PS layers were uniform, and consisted of columns with cross-sectional diameters significantly less than 10 nm. The luminescence measurement revealed that the wavelength of the photoluminescence （PL） peaks was at 690 nm, which was somewhat shifted toward the higher energy suit as compared with that of the porous silicon obtained by anodic etching. A blue band around 430 nm appeared after rapid thermal oxidation （RTO） of the hydrothermally etched sample in air at 950℃ for 30 s. These results are interpreted in the hght of the present theories suggested
Fabrication of Silicon-Based Template-Assisted Nanoelectrode Arrays and Ohmic Contact Properties Investigation.

Anqi Bai,Buwen Cheng,Xiaofeng Wang,Chunlai Xue,Yuhua Zuo,Qiming Wang

DOI: https://doi.org/10.1166/jnn.2010.2845

2010-01-01

Journal of Nanoscience and Nanotechnology

Abstract:A convenient fabrication technology for large-area, highly-ordered nanoelectrode arrays on silicon substrate has been described here, using porous anodic alumina (PAA) as a template. The ultrathin PAA membranes were anodic oxidized utilizing a two-step anodization method, from Al film evaporated on substrate. The purposes for the use of two-step anodization were, first, improving the regularity of the porous structures, and second reducing the thickness of the membranes to 100-200 nm we desired. Then the nanoelectrode arrays were obtained by electroless depositing Ni-W alloy into the through pores of PAA membranes, making the alloy isolated by the insulating pore walls and contacting with the silicon substrates at the bottoms of pores. The Ni-W alloy was also electroless deposited at the back surface of silicon to form back electrode. Then ohmic contact properties between silicon and Ni-W alloy were investigated after rapid thermal annealing. Scanning electron microscopy (SEM) observations showed the structure characteristics, and the influence factors of fabrication effect were discussed. The current-voltage (I-V) curves revealed the contact properties. After annealing in N2 at 700 degrees C, good linear property was shown with contact resistance of 33 omega, which confirmed ohmic contacts between silicon and electrodes. These results presented significant application potential of this technology in nanosize current-injection devices in optoelectronics, microelectronics and bio-medical fields.
Fabrication and Characterization of Porous Mullite Coating on Porous Silicon Carbide Support

Ning Wang,Xiao Zhan Yang,Jian Bao Li,Hong Lin,Bo Chi

DOI: https://doi.org/10.4028/www.scientific.net/KEM.280-283.1301

2007-01-01

Key Engineering Materials

Abstract:Mullite powders of stoichiometric composition were synthesized by sol-gel process with TEOS and Al(NO3)(3).9H(2)O as silicon and aluminum source. Homogeneous mullite powders were used as the starting materials to prepare the porous mullite coating on the porous silicon carbide support by repeated dip-coating method. XRD analysis revealed that the mullite precursor gels almost completely transformed to orthorhombic crystalline mullite at 1200degreesC. The average pore diameter and porosity of the porous mullite coating were about 4.5mum and 52.3%, respectively.
Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Tao Deng,Yifan Wang,Qi Chen,Houjin Chen,Zewen Liu

DOI: https://doi.org/10.1016/j.apsusc.2016.07.171

IF: 6.7

2016-01-01

Applied Surface Science

Abstract:This paper presents an improved wet etching method for the massive production of silicon nanopore arrays. The shape (length-width ratio) of the nanopore can be easily tuned by changing the wet etching mask and controlling the etching time. By adopting silicon on insulator (SOI) wafers, the pore size uniformity of the nanopore arrays was significantly improved. Square and rectangular nanopore arrays with feature pore sizes down to 18 nm were controllably fabricated. Experiments demonstrated that such Si nanopore arrays with tunable pore shapes and sizes can act as reusable stencils for the nanostencil lithography, to directly deposit large-scale ordered arrays of surface micro/nano structures on various substrates with less time and low cost. (C) 2016 Elsevier B.V. All rights reserved.
Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

Junfu Liu,Lingang Zhang,Ning Gu,Qingyue Hong,Jiyun Ren,Yanpeng Wu,Pansong Mao,Deying Chen,Zuhong Lu

DOI: https://doi.org/10.1016/S0968-5677(98)00108-4

1998-01-01

Supramolecular Science

Abstract:This paper provides a new method to the micro-patterning of 3-aminopropyl-trimethoxysilane (ATS) self-assembled monolayers by colloidal Au. Photolithographing of ATS self-assembled monolayers on SiO2-coated Si substrates and subsequent assembly of colloidal Au to the amino terminal groups in the unirradiated regions lead to the formation of Au microstructures. As revealed by scanning electron microscopy, the colloidal Au closely replicates the mask patterns on the unirradiated regions. The present approach may be applicable to fabrication of microelectronic circuits and microbiosensors.
Fabrication and Optical Properties of the Si Honeycomb Structure Via Colloidal Monolayer Template

Ying Wu,Peiyu Wang,Congmian Zhen,Kaiqi Zhang,Wenzhe Guo,Xiaoxia Zhai,Li Ma,Denglu Hou

DOI: https://doi.org/10.1007/s10934-017-0416-z

2017-01-01

Journal of Porous Materials

Abstract:We use solution immersion method to prepare the SiO2 network structure. A single-layer PS sphere template was immersed in SiO2 precursor solution for a certain period of time. Filter paper was used to absorb the residual liquid, and then the PS nanospheres were removed by high temperature-annealing to form SiO2 network structure. The Si honeycomb structure was formed on the SiO2 network structure by chemical vapor deposition method. The longer growth time caused the smaller sizes of the Si apertures and produced various quantum size effects. When the growth time is 15 min, the thermal conductivity of the sample is the lowest. The heat conduction behavior of the 15 min sample is similar to that of a phonon crystal due to the aperture size of the sample is almost the same as the mean free path of phonons. Scattering at the interface of the isolated honeycomb microstructures also contributed to the low thermal conductivity. The position and number of the reflection peak of the sample can be controlled by the deposition time. The luminescence properties of the samples are greatly influenced by the surface topography.

Fabrication of the porous silicon though a self-assembled porous alumina template

Fabrication of the Similar Porous Alumina Silicon Template for Soft UV Nanoimprint Lithography

Preparation of Si Nanocrystals Using Anodic Porous Alumina Template Formed on Silicon Substrate

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Preparation of Porous Silicon Templates in Two Steps of Au-Assisted Chemical Etching

Porous Silicon Templates Prepared by Cu-Assisted Chemical Etching

Al-assisted Anodic Etched Porous Silicon

A Template-Based Method for Preparing Ordered Porous Silicon

Fabrication and characterization of vertically aligned carbon nanotubes on silicon substrates using porous alumina nanotemplates.

Large-Scale Preparation of Uniform Nanopatterned Silicon Substrates by Inductively Coupled Plasma Etching Using Self-Assembled Anodic Alumina Masks

Anodizing process of Al films on Si substrates for forming alumina templates with short-distance ordered 25 nm nanopores

A novel method of fabricating porous silicon material: ultrasonically enhanced anodic electrochemical etching

Large Area Assembly of Patterned Nanoparticles by a Polydimethylsiloxane Template

Long-Range-Ordered Ag Nanodot Arrays Grown on Gaas Substrate Using Nanoporous Alumina Mask

Macroporous silicon templated from silicon nanocrystallite and functionalized SiH reactive group for grafting organic monolayer

Novel Technique for Preparation of Porous Silicon

Fabrication of Silicon-Based Template-Assisted Nanoelectrode Arrays and Ohmic Contact Properties Investigation.

Fabrication and Characterization of Porous Mullite Coating on Porous Silicon Carbide Support

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Micro-patterning of 3-aminopropyltrimethoxy- silane self-assembled monolayers with colloidal gold

Fabrication and Optical Properties of the Si Honeycomb Structure Via Colloidal Monolayer Template