Abstract:There is an urgent need in surface mount technology (SMT) for a nontoxic, reusable and low temperature bonding technique which can afford good mechanical support as well as electrical contact. Meanwhile in the nanotechnology, many excellent and unique structure-related properties such as the high mechanical strength, the high conductivity and the adhesion ability of gecko feet have been studied. Our lab proposes a new patterned structure of Au nanowire array named nanowire surface fastener (NSF), which cold bonding for surface mount technology can be realized at room temperature. Then various methods have been developed to fabricate nanowire, such as arc discharge, catalytic CVD growth and template synthesis, and so on. Among these methods, the template method has been widely used for preparing one-dimensional nanostructures such as metals, semiconductors, polymers, and other materials by electrochemical, electroless deposition or sol-gel technique. Especially anodic aluminum oxide template assisted way has attached considerable attention due to its unique structure properties, such as controllable pore diameter, extremely narrow pore size distribution with high densities, high aspect ratios, and ideally cylindrical pore shape. The well arranged porous anodic aluminum oxide membrane is fabricated from aluminum film by two steps zM oxalic acid electrolytes. The anodic aluminum oxide membrane was investigated for features such as pore size, interpore distance, and thickness by 40 V. It is important for fabrication of porous anodic aluminum oxide template to find out elimination of the barrier layer of oxide and the pore extending rate by 0.5 M phosphoric acid. Morphologies of surface of aluminum film between anodization process and the anodic aluminum oxide barrier layer was researched by using atomic force microscope and scanning electron microscope. Results showed that the anodic aluminum oxide having the same diameter of the pore and the well arranged pore array without branching channel was obtained. The diameter of the pore before the pore extending treatment is 42 nm and the diameter of the pore after the pore extending treatment for 30 minutes is 86 nm. It was found that the diameter of the pore increased per 15 nm by the pore extending treatment for 10 minutes. We fabricated the through-hole anodic aluminum oxide template and made Cu nanowire by the template of our own making. By using Cu nanowire, we try to produce nanowire surface fastener and evaluate its properties.

Fabrication of the Similar Porous Alumina Silicon Template for Soft UV Nanoimprint Lithography

Fabrication of in Situ Ultrathin Anodic Aluminum Oxide Layers for Nanostructuring on Silicon Substrate

Superior nanopatterns via adjustable nanoimprint lithography on aluminum oxide in high-K thin films with ultraviolet curable polymer

Nanofabrication of Sic Templates for Direct Hot Embossing for Metallic Photonic Structures and Meta Materials

Fabrication of Anodic Aluminum Oxide Template and Cu Nanowire Surface Fastener

Patterned Microstructure Array Fabrication By Using A Novel Standing Surface Acoustic Wave Device

Preparation of Si Nanocrystals Using Anodic Porous Alumina Template Formed on Silicon Substrate

UV-assisted nanoimprint lithography: the impact of the loading effect in silicon on nanoscale patterns of metalens

Fabrication of nanoscale stencils through focused ion beam milling and dry transfer of silicon-on-nothing membrane with perforations

Planar Self-Aligned Imprint Lithography for Coplanar Plasmonic Nanostructures Fabrication

Massive Fabrication of Silicon Nanopore Arrays with Tunable Shapes

Fast Patterning and Dry-Etch of SiNxfor High Resolution Nanoimprint Templates

Unconventional Lithography for Patterned Nanomaterials

Fabrication of 2D silicon nano-mold by side etch lift-off method

Fabrication of Large-Area Nanostructures Using Cross-Nanoimprint Strategy

A Method to Fabricate a Template with a Long Range Ordered Dense Array of True Nanometer Scale Pits

Direct Imprint Patterning of 2-D and 3-D Nanoparticle/polymer Hybrid and Crystalline Metal Oxide Structures for Printed Optical, Electronic, and Energy Devices

Direct nanoimprint lithography of Al₂O₃ using a chelated monomer-based precursor

Fabrication of Silicon-Based Template-Assisted Nanoelectrode Arrays and Ohmic Contact Properties Investigation.

Development of Novel SU-8 Based Nanoimprint Lithography

CMOS-Compatible Electrochemical Nanoimprint:High Throughput Fabrication of Ordered Microstructures on Semiconductor Wafer by Using a Glassy Carbon Mold