Mxene Synthesis: HCl‐Based Hydrothermal Etching Strategy Toward Fluoride‐Free MXenes (adv. Mater. 27/2021)

Changda Wang,Hongwei Shou,Shuangming Chen,Shiqiang Wei,Yunxiang Lin,Pengjun Zhang,Zhanfeng Liu,Kefu Zhu,Xin Guo,Xiaojun Wu,Pulickel M. Ajayan,Li Song
DOI: https://doi.org/10.1002/adma.202170209
IF: 29.4
2021-01-01
Advanced Materials
Abstract:New synthesis strategies of fluoride-free MXenes beyond Ti3C2Tx are imperative to extend 2D MXenes. In article number 2101015, Pulickel M. Ajayan, Li Song, and co-workers simulate the feasibility of etching various MAX materials in HCl solution influenced by temperature and pressure. Fluoride-free Mo2CTx MXene is then obtained with high quality and efficiency via a controllable HCl hydrothermal etching method, which exhibits a modulated energy-storage mechanism.
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