Optimal V<inf>DD</inf> Assessment of CMOS Technology Considering Circuit Reliability Tradeoffs

Minghao Liu,Shaofeng Guo,Runsheng Wang,Ru Huang
DOI: https://doi.org/10.1109/CSTIC.2019.8755708
2019-01-01
Abstract:In this paper, the NBTI-induced circuit frequency degradation is found having a non-monotonic bias dependence, thus an optimal V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DD</sub> can be assessed based on this reliability tradeoff. As a demonstration, based on our recently-developed compact aging model and circuit reliability simulator, NBTI-induced frequency degradation in inverters are simulated, in terms of various V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">th</sub> and V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DD</sub> , considering two typical stress waveforms. The results show the relationships between the optimal V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DD</sub> of circuit and various stress conditions, which are useful to the reliability-aware V <sub xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink">DD</sub> optimization for CMOS technology.
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