446 Development of a Microwave AFM Probe Based on GaAs

Motohiro HAMADA,Yang JU
DOI: https://doi.org/10.1299/jsmemecjo.2008.8.0_191
2008-01-01
The proceedings of the JSME annual meeting
Abstract:In order to develop a new structure microwave probe, the fabrication of AFM probe on the GaAs wafer was studied. A waveguide was introduced by evaporating metal film on the top and bottom surfaces of the GaAs AFM probe. A tip having 8 μm high, and curvature radius about 50 nm was formed. The dimensions of the cantilever are 250×30×15 μm. The open structure of the waveguide at the tip of the probe was introduced by using FIB fabrication. AFM topography of a grating sample was measured by using the fabricated GaAs microwave probe. The fabricated probe was found having nanometer scale resolution. Microwave emission was detected successfully at the tip of the probe by approaching Cr-V steel sample.
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