Tuning Phase Transition Temperature of VO_2 Thin Films with Annealing O_2 Pressure

Shao-Wei Wang,Xingxing Liu,ruonan Ji
DOI: https://doi.org/10.1364/oic.2016.md.10
2016-01-01
Abstract:Phase transition temperature is very important for application of VO2 films as “smart window”, which can help control the room temperature intelligently. It used to be tuned by doping which is complicated and expensive. A simple new way to tune the optical phase transition temperature of VO2 films was proposed by only controlling the pressure of oxygen during the annealing process. V films were deposited on glass by a magnetron sputtering coating system and then annealed in appropriate oxygen atmosphere to form the VO2 films. The infrared transmission change (at 2400 nm) is as high as 58% for the VO2 thin film on glass substrate, which is very good for tuning infrared radiation and energy saving as smart windows. The phase transition temperature of films can be easily tuned from intrinsic temperature of 68 ℃ to 44.7 ℃ and 40.2℃ on glass and sapphire by annealing oxygen pressure, respectively.
What problem does this paper attempt to address?