Low pressure thermal annealed fabrication of VO2 on glass with excellent optical properties

Jinshi Zhao,Jiacheng Li,Chenyang Hao,Qiuyang Li,Wei Mi,Xiaoyong Qiang,Liwei Zhou
DOI: https://doi.org/10.1016/j.mssp.2021.105658
IF: 4.1
2021-05-01
Materials Science in Semiconductor Processing
Abstract:<p>In this study, VO<sub>2</sub> was deposited on glass through low pressure annealed metal vanadium thin film. The crystal structure, surface morphology and optical transmittance property of the film were characterized by X-ray diffraction, scanning electron microscopy and UV/VIS/NIR spectrophotometer, respectively. When the film thickness is higher than 88 nm, XRD showed that the deposited films appears only at 27.92° indexed to VO<sub>2</sub> (011). The calculated grain sizes of VO<sub>2</sub> increased from 33.6 nm to 39.2 nm with the increasing of film thickness. The thermal hysteresis showed that the phase transition temperature is in a range of 53–58 °C, which is much lower than that of single crystal VO<sub>2</sub> (68 °C). In addition, the films exhibit the optimal thermochromic performance with the luminous transmittance of 48.2% and the solar modulation of 6.7%. This method revealed the facile fabrication of large scale high performance VO<sub>2</sub> on glass for thermochromic based devices.</p>
engineering, electrical & electronic,materials science, multidisciplinary,physics, condensed matter, applied
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