High Infrared Reflectance Modulation in VO2 Films Synthesized on Glass and ITO coated Glass substrates using Atmospheric Oxidation of Vanadium

Ashok P,Yogesh Singh Chauhan,Amit Verma

DOI: https://doi.org/10.1016/j.optmat.2020.110438

2021-06-26

Abstract:Vanadium Dioxide (VO2) is a strongly correlated material, which exhibits insulator to metal transition at ~68 C along with large resistivity and infrared optical reflectance modulation. In this work, we use atmospheric pressure thermal oxidation of Vanadium to synthesize VO2 films on glass and ITO coated glass substrates. With the optimized short oxidation durations of 2 min and 4 min, the synthesized VO2 film shows high optical reflectance switching in long-wavelength infrared on glass substrates and mid-wavelength infrared on ITO coated glass substrates, respectively. Peak reflectance switching values of ~76% and ~79% are obtained on the respective substrates, which are among the highest reported values. Using the reflectance data, we extract VO2 complex refractive index in infrared wavelengths, in both the insulating and metallic phases. The extracted refractive index shows good agreement with VO2 synthesized using other methods. This demonstration of high optical reflectance switching in VO2 thin films, grown on low cost glass and ITO coated glass substrates, using a simple low thermal budget process will aid in enhancing VO2 applications in the optical domain.

Applied Physics,Materials Science,Optics

What problem does this paper attempt to address?

The problem this paper attempts to address is how to synthesize vanadium dioxide (VO₂) thin films with high infrared reflectance modulation performance on low-cost glass and ITO (indium tin oxide) coated glass substrates using an atmospheric pressure thermal oxidation method. Specifically, the researchers aim to achieve the following goals by optimizing oxidation time and temperature:

1. **Improve Optical Performance**: Achieve high reflectance modulation in the long-wave infrared (LWIR, 8-14 μm) and mid-wave infrared (MWIR, 3-5 μm) bands, thereby enhancing the potential applications of VO₂ thin films in the optical field.

2. **Simplify the Preparation Process**: Use a simple and low-cost atmospheric pressure thermal oxidation method, avoiding complex equipment and high-cost processes such as traditional reactive sputtering and chemical vapor deposition methods.

3. **Reduce Thermal Budget**: Achieve the preparation of high-quality VO₂ thin films under low thermal budget process conditions (e.g., 450°C/2 minutes and 450°C/4 minutes), reducing energy consumption and production costs.

4. **Verify Optical Properties**: Validate the optical properties of the prepared films by extracting the complex refractive indices of VO₂ thin films in both the insulating and metallic states and comparing them with data from the literature.

In summary, this study aims to develop a simple, low-cost, and efficient preparation method to obtain high-performance VO₂ thin films on low-cost substrates, thereby expanding their application range in the optical field.