Fast lithographic source optimization adopting a certain interval contour sampling compressive sensing

Zhen Li,Yanqiu Li,He Yang,Miao Yuan,Zhiwei Zhang,Weichen Huang,Zhao Xuan Li
DOI: https://doi.org/10.1364/ao.534722
IF: 1.9
2024-12-08
Applied Optics
Abstract:Zhen Li, Yanqiu Li, He Yang, Miao Yuan, Zhiwei Zhang, Weichen Huang, Zhao Xuan Li Fast source optimization (SO) is an urgent need for 14-5 nm node integrated lithography online technology. Our earlier contour ... [Appl. Opt. 63, 9103-9109 (2024)]
optics
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