Abstract:Lithium niobate (LiNbO3, LN) on insulator (LNOI) has emerged as a promising platform for integrated photonics, due to the strong optical confinement and excellent nonlinear optical and electrical characteristics of LN crystal. Focused ion beam (FIB) as a versatile technique has become a typical way to fabricate LNOI microstructures. However, due to the bombardment of Ga+ ions during fabrication, the LN lattice is damaged, which would deteriorate the performance of LNOI devices. Thus, the recognition of the damage formed by FIB fabrication is necessary for the control and optimization of the properties of LN microstructures. However, previous studies on this issue have not delved into it from a lattice perspective. Here, we conducted an investigation into the damage inflicted on LN film due to FIB fabrication and the subsequent impact of buffered oxide etching (BOE) treatment on this damage using Raman spectroscopy. Our findings indicate that the interaction between Ga+ ions and LN film results in lattice amorphization, as well as a reduction in the ionic bonding and lattice stress within LN. Furthermore, absorption spectra were acquired both before and after BOE treatment, revealing the emergence of additional optical losses attributed to Ga+ ions. Notably, these defects responsible for optical losses are predominantly concentrated near the surface of the milled LN film, and BOE treatment proves efficient in their removal. This study contributes to further understanding of the defect structure in LN film after FIB fabrication, as well as repairing the damage and, thus, improving the performance of LN microstructures.

Effects of helium implantation fluence on the crystal-ion-slicing fabrication of Y-cut lithium niobate film

Fabrication of Y128- and Y36-cut Lithium Niobate Single-Crystalline Thin Films by Crystal-Ion-slicing Technique

Surface Modifications of Crystal-Ion-sliced LiNbO3 Thin Films by Low Energy Ion Irradiations

Ion Implantation Caused Defects and Their Effects on LiTaO3 Crystal Exfoliation

Fabrication of Y128-cut and Y36 crystal

Lattice Disorder Produced in Gan by He-Ion Implantation

Investigation of etching two-dimensional microhole lattice array on lithium niobate with focused ion beam for fabricating photonic crystals

The Structural Evolution of Light-Ion Implanted 6H-Sic Single Crystal: Comparison of the Effect of Helium and Hydrogen

The Effects of Xe Irradiation on He and H Co-Implanted Si

The Electrical Properties of Single-Crystalline Z-cut LiNbO3 Thin Films Fabricated by Crystal-Ion-slicing Technique

Dose-dependent Optical Properties and Laser Damage of Helium-Implanted Sapphire

Effects of Rapid Thermal Annealing Parameters on Crystal Ion Slicing-Fabricated LiTaO3 Thin Film

Fabrication of ion-sliced yttrium-aluminum-garnet thin films on silica by He+ implantation and Cu–Sn bonding

The Effects of Swift Heavy-Ion Irradiation on Helium-Ion-implanted Silicon

Structural and Optical Properties of 6h–sic Helium-Implanted at 600 K

Raman characterization of focused ion beam fabricated lithium niobate film

Microstructure evolution and performance degradation of sol-gel silica films induced by helium ion irradiation

Lattice Damage, Optical and Electrical Properties Induced by H and C Ions Implantation in Nd:YLF Crystals

Effects Of He+ And H+ Co-Implantation With High Energy On Blisters And Craters Of Si And Sio2-On-Si Wafers

Effects of low-fluence swift iodine ion bombardment on the crystallization of ion-beam-synthesized silicon carbide

H+ Implantation Induced Defects Distribution in 4H-Sic Single Crystal Film Fabricated by Crystal-Ion-Slicing and Its Effects on Electrical Behavior: A Multiple Characterization Study