Characterization Of An Hfvcd Boron-Doped Sub-Microcrystalline Diamond Film

Xm Li,Z Zhen,Dr Chen,Jd Wang

2002-01-01

Abstract:A boron-doped diamond film was deposited on silicon substrates by a hot filament chemical vapor deposition (HFVCD) system. Structure, composition and surface morphology of the films were studied with SEM, AFM, XPS, AES and Raman spectroscopy. Grains of the submicrocrystalline diamond (NCD) films assume an average size of 300nm. As it lies between those of NCD films and microcrystalline diamond (MCD) films, they are called sub-microcrystalline diamond films. Relatively sharp peaks are observed at 1 250, 1 325 and 1 550 cm(-1) in the Raman spectra. No peak is observed at 1 140cm(-1) in the Raman spectra which are usually characteristic of the Raman spectra of NCD. The reason is that the grain size of the sub-microcrystalline diamond films is larger than that of NCD (50similar to100 nm). By comparing the Raman spectra of the submicrocrystalline diamond films with calculations of the vibrational density of states, we suggest that broad peak at about 1 250 cm(-1) is assigned to the amorphous sp(3) bonded carbon, A feature at 1 550 cm(-1) is assigned to localized sp(2) bonded pairs of carbon atoms.