Slow Highly Charged Ion O4+ Induced Electron Emission From Clean Solid Surfaces

Xu Zhong-Feng,Zhao Yng-Tao,Wang Yu-Yu,Zhao Di,Wang Jian-Guo,Li De-Hui,Qayyum Abdul,Li Fu-Li,Xiao Guo-Qing
IF: 2.944
2008-01-01
Chinese Physics C
Abstract:The. total electron emission yields following the interaction of slow highly charged ions (SHCI) O4+ with different material surfaces (W, Au, Si and SiO2) have been measured. It is found that the electron emission yield gamma increases proportionally with the projectile velocity v ranging from 5.36 x 10(5)m/s to 10.7 x 10(5)m/s. The total emission yield is dependent on the target materials, and it turns out to follow the relationship gamma(Au) > gamma(Si)> gamma(W). The result shows that the electron emission yields are mainly determined by the electron stopping power of the target when the projectile potential energy is taken as a constant, which is in good agreement with the former studies.
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