Modulating the Electrical Transport Characteristics of a Metal-Semiconductor-Metal Structure by Local Strain Gradient

Youchao Huang,Shenhui Ma,Jiaona Zhang,Chao Xie,Min Zhang
DOI: https://doi.org/10.1109/NEMS51815.2021.9451518
2021-01-01
Abstract:Metal-semiconductor-Metal (M-S-M) structure is widely used in electronic devices, which plays a key role in device performance. Here, we propose a simple and effective way to modulate the contact characteristics of aluminum (AI)-amorphous indium gallium zinc oxide (a-IGZO)-molybdenum (Mo) structure by applying local strain at the interface between Al layer and a-IGZO layer. Four types of I-V curve...
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