Top gate medium for carbon-based field-effect transistors, and preparation method thereof

Lianmao Peng,Sheng Wang,Zhenxing Wang,Zhiyong Zhang
2010-01-01
Abstract:The invention discloses a top gate medium for carbon-based field-effect transistors, and a preparation method thereof. Yttrium oxide is directly taken as the top gate medium of carbon-based field-effect transistors. The preparation method comprises: taking carbon nanotubes or grapheme and other carbon-based materials as a conductive channel; growing a yttrium thin film a channel region; oxidizing yttrium into yttrium oxide by a thermal oxidation method; and obtaining a yttrium oxide thin film taken as the top gate medium. The preparation method realizes that high-permittivity top gate media are directly grown on the surfaces of carbon nanotubes and graphene for the first time, and solves the problem that atomic layer deposition cannot nucleate or grow high-permittivity gate dielectric film on the surfaces of carbon nanotubes or grapheme. An yttrium oxide top gate medium has high permittivity and good insulation property, realizes efficient gate modulation, and is simple in manufacture process and low in material and process cost, thereby providing a solution for realizing carbon-based high-performance devices and meeting the demand of carbon-based large-scale integrated circuits.
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