Voltage‐Driven Fluorine Motion for Novel Organic Spintronic Memristor
Abir Nachawaty,Tongxin Chen,Fatima Ibrahim,Yuchen Wang,Yafei Hao,Kevin Dalla Francesca,Priyanka Tyagi,Antonio Da Costa,Anthony Ferri,Chuanchuan Liu,Xiaoguang Li,Mairbek Chshiev,Sylvie Migot,Laurent Badie,Walaa Jahjah,Rachel Desfeux,Jean‐Christophe Le Breton,Philippe Schieffer,Arnaud Le Pottier,Thomas Gries,Xavier Devaux,Yuan Lu
DOI: https://doi.org/10.1002/adma.202401611
IF: 29.4
2024-06-08
Advanced Materials
Abstract:Integrating tunneling magnetoresistance (TMR) effect in memristors is a long‐term aspiration because it allows to realize multifunctional devices, such as multi‐state memory and tunable plasticity for synaptic function. However, the reported TMR in different multiferroic tunnel junctions is limited to 100%. Here, we demonstrate a giant TMR of ‐266% in La0.6Sr0.4MnO3(LSMO)/poly(vinylidene fluoride)(PVDF)/Co memristor with thin organic PVDF barrier. Different from the ferroelectricity‐based memristors, we discover that the voltage‐driven F motion in the junction generates a huge reversible resistivity change up to 106% with ns timescale. The removing F from PVDF layer suppresses the dipole field in the tunneling barrier, thereby significantly enhances the TMR. Furthermore, the TMR can be tuned by different polarizing voltage due to the strong modification of spin‐polarization at the LSMO/PVDF interface upon F doping. The combining of high TMR in the organic memristor paves the way to develop high‐performance multifunctional devices for storage and neuromorphic applications. This article is protected by copyright. All rights reserved
materials science, multidisciplinary,chemistry, physical,physics, applied, condensed matter,nanoscience & nanotechnology