The Preparation of Gold Nanoparticles on SiO2/Si Substrate

Yihong XU,Chen WANG,Xiang HAN,Shumei LAI,Songyan CHEN
DOI: https://doi.org/10.6043/j.issn.0438-0479.201601001
2016-01-01
Abstract:Gold (Au)nanoparticles are fabricated on SiO2/Si substrate by the combination of radio frequency magnetron sputtering and rapid thermal annealing.Effects of the sputtering condition and the annealing temperature on the size and the distribution of Au nanoparticles are investigated.Results show that samples with discrete-and small-sized Au nanoparticles after sputtering deposition enjoy high thermal stabilities.By contrast,for samples with continuous Au film,the size of Au nanoparticles change non-monotonicity with the increase of annealing temperatures.This phenomenon can be attributed to the existence of two competing mechanisms, namely,the relaxation of stress and surface energy minimization during annealing processes.Finally,the high number density (1.1 × 1012 cm-2 )and small sizes (<5 nm)of Au nanoparticles are achieved by the decrease of sputtering power,offering guides for the ap-plication to metal nanocrystal semiconductor memory.
What problem does this paper attempt to address?