ATOMIC STRUCTURES AND DYNAMIC PROCESSES OF Ge AND Si SURFACES

Wei-Sheng YANG,Zheng GAI
DOI: https://doi.org/10.3321/j.issn:0379-4148.2000.11.003
2000-01-01
Physics
Abstract:Silicon is the basis of the microelectronics indu stry,and silicon and germanium surfaces and interfaces have been under intensive investigation for several decades.However,compared to the questions that are be ing raised by nanoscience and technology,our knowledge in this context is still quite incomplete.Accordingly,by means of scanning tunneling microscopy and low- energy electron diffraction,we have been carrying out a systematic and comparati ve investigation of the stability,faceting,nanofaceting,surface specific free en ergy,and atomic structure of high-index germanium and silicon surfaces,along wi th some surface dynamic processes.These results are expected to be interesting n o t only from the point of view of basic science,but should also be helpful to app lications such as selection of substrates for semiconductor heteroepitaxial g rowth and preparation of templates for the growth of nanowires and nanodots.
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