Research on focusing system characteristics and defocusing application in laser direct writer

Yi-yong LIANG,Guo-guang YANG,Rong SUN
DOI: https://doi.org/10.3785/j.issn.1008-973X.2005.02.021
2005-01-01
Abstract:For efficiently fabricating multi-width lines by direct lithography, a new focusing method based on dual-quadrant detector was proposed to apply in polar laser direct writers. The new method is fit for fabricating various linewidth under defocusing status. According to the different features of two principle defocusing sources, rotary spindle and linear platform, the rapid accurate unit and slow rough unit compensated defocus together. The micro-displacement piezo-actuator, dual-quadrant photoelectric detector and high-voltage operational amplifier constitute the input, output and drive section, respectively. A uniform spiral of 3.0 μm linewidth was fabricated under defocusing mode in laser direct writer. The result shows the practibility of defocusing method in fabricating different linewidth.
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