Controlling the growth conditions to prepare millimeter size single crystal graphene by chemical vapor deposition

Guoqing ZHOU,Lin HU,Lingzhi WEI,Fapei ZHANG
DOI: https://doi.org/10.3969/j.issn.1001-9731.2017.04.019
2017-01-01
Abstract:The effective controlling of the graphene nucleation and growth kinetics is critical to grow single crystal graphene.In this paper,single crystalline graphene with a large size of 4 mm was achieved via the optimization of the processing parameters of low pressure chemical vapor deposition (CVD).The graphene samples are proved to be high quality single-layer graphene,inspected by a series of structural and morphological characterizations.Furthermore,the sub-millimeter size multi-layer single crystal graphene with A-B stacking,as well as the overlapped layer structure formed by two converged graphene domains was observed.It is also found that the properties of the Cu substrates such as its bulk oxygen content play a significant role on nucleation density and morphology of single crystal graphene,by utilizing three types of copper foil substrates for the CVD process.Surface texture of three types of the Cu foils also exhibit different transition behavior after the CVD process.Finally,the field effect transistors based on the as-deposited large-size single crystal graphene have been fabricated,displaying high carrier mobility.
What problem does this paper attempt to address?