Oxide-assisted Growth of Scalable Single-Crystalline Graphene with Seamlessly Stitched Millimeter-Sized Domains on Commercial Copper Foils.

Yang Wang,Yu Cheng,Yunlu Wang,Shuai Zhang,Xuewei Zhang,Shaoqian Yin,Miao Wang,Yang Xia,Qunyang Li,Pei Zhao,Hongtao Wang
DOI: https://doi.org/10.1039/c8ra00770e
IF: 4.036
2018-01-01
RSC Advances
Abstract:Chemical vapor deposition (CVD) is considered as an effective route to obtain large-area and high-quality polycrystalline graphene; however, there are still technological challenges associated with its application to achieve single crystals of graphene. Herein, we present the CVD growth of scalable single-crystalline graphene by seamless stitching millimeter-sized unidirectional aligned hexagonal domains using different types of commercial Cu foils without repeated substrate polishing and H2-annealing processes. Compared with that reported in previous studies, herein, the average size for the hexagonal graphene domains is enlarged by 1-2 orders of magnitude (from tens of micrometers to millimeter). The key factor for growth is the Cu surface monocrystallization achieved by a pre-introduced oxide layer and the sequential Ar annealing. The graphene domains exhibit an average growth rate of >20 μm min-1 and a misorientation possibility of <2%, and seamless stitching at the domain coalescence interfaces is confirmed by atomic force microscopy measurements.
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