Novel effect of Y thin film to the N-O concentration in Gd by magnetron sputtering

Li LI,Guo-ling LI,Li-hui HAN,Xing-guo LI
DOI: https://doi.org/10.3969/j.issn.1001-9731.2014.17.006
2014-01-01
Abstract:A novel two-step purification of Gd was devised.Y was deposited on the free surface of Gd samples by magnetron sputtering,and the deposited samples were subsequently annealed to diffuse oxygen and nitrogen from the Gd bulk to the Y coating layer.Due to the different annealing temperature,the removal degree of oxy-gen and nitrogen was different.In addition,it was found that each removal degree was attributable to a differen-tial refining effect caused by the difference of initial impurity concentration.The trace oxygen and nitrogen as analyzed by O-N analyzer reduced from 1.89×10 -4 ,9.7×10 -5 for raw Gd to 5.5 ×10 -5 ,3.3×10 -5 .The differ-ent process parameters were optimized and the analysis results were discussed.
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