Analysis of Photon-Induced Refractive Index Change Based on GaAs/AlGaAs Quantum Wells Materials

LI Long-zhi,YANG Jian-yi,WANG Ming-hua,JIANG Xiao-qing
DOI: https://doi.org/10.3969/j.issn.1005-5630.2005.05.031
2005-01-01
Abstract:The primary analysis of photon-induced refractive index change based on GaAs/AlGaAs quantum wells materials is presented in this paper.The effect of photon-excited carriers were treated self-consistently.For transmitting light at 1.55μm(1.3μm),Δn can reach-10~(-2) at 1μm depth along z axes when the power density of controlling light(805nm) is 6×10~3W/cm~2(8×10~3W/cm~2).Compared with the model based on GaAs bulk materials,the model based on quantum wells materials can reduce the controlling power density by about 20% to reach the same photon-induced refractive index change,and also decrease the controlling power consumption for all-optical switches and all-optical modulators.
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