State of the Art on Study of Parametric Yield and Its Optimization for VLSI

HAO Yue,Jing Ming-e,Ma Pei-jun
DOI: https://doi.org/10.3321/j.issn:0372-2112.2003.z1.006
2003-01-01
Abstract:Parametric Yield of VLSI is an important factor related with manufactory cost and circuit performance.With development of deep sub-micron IC technologies,chips have led to a large increase in system complexity and the number of devices per die as well as the switching speeds.These advances have been accompanied by parametric yield loss due to the fluctuations in the manufactory process.Firstly,models and design technology of parametric yield is systematically discussed in this paper.Their advantages and disadvantages are discussed in details.Finally,the main problems and developing direction of parametric yield design and enhancement in very deep sub-micron regime are given.
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