X-ray Study on the Defects Induced by Cd-doped InSb

LIU Yu-dong,DU Hong-yan,ZHANG Gang,DONG Shuo,MA Ju-sheng
DOI: https://doi.org/10.3969/j.issn.1001-5078.2005.03.011
2005-01-01
Abstract:Diffusion-induced defects occurred when Cd was doped into InSb to form N-type semiconductor. The change of the dislocation density in InSb wafer, before or after doped, was observed and compared by using the double-crystal diffraction technique and the X-ray topology of synchrony radio accelerator. The result showed that the doping not only increased the dislocation density, but also increased FWHM (Full Width at Half Maximum). The X-ray topography of InSb with a low FWHM showed no dislocations, and that of InSb with a high FWHM showed an array of dislocation. This paper conclude etching processing can effectively remove the surface layer with a high density of defects.
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