Abstract:HfO2 thin films arc deposited on the crystal and the laser ceramic by electron beam evaporation technology respectively.Grazing incidence X-ray diffraction (GIXRD) and nano-scratch tester are used to investigate the crystalline structures and mechanical properties of the films.The experimental results show that crystalline orientations of the HfO2 films on single crystal substrate and polycrystalline ceramic substrate are all polycrystalline structures,and have (020)preferred growth,while the films on ceramic structures have stronger preferred orientation.The crystal-HfO2 films with a worse adhesive force have more diffraction peaks,while the ceramic-HfO2 films with a better adhesive force have less diffraction peaks.Compared with the X-ray diffraction (XRD) results of two substrates and the films coated on them,the difference between single crystal structure of crystalline substrate and polycrystalline structure state of film is big,which contributes to a bigger residual stress,and a worse adhesive force between the crystal and the film.The weak binding force leads to small constraint effect of substrate on films.So,the films on the substrate of single crystal have more diffraction peaks.The difference between polycrystalline structure of ceramic substrate and the polycrystalline structure of films is small.This similar crystalline state makes the preferred orientation of the films more obvious and weakens the residual stress.So the adhesive force between the ceramic substrate and the HfO2 film is relatively better than that of crystabHfO2 system.The strong binding force limits the growth of crystal orientation of HfO2 films,and the diffraction peaks of the films are less.

Influence mechanism of laser conditioning on the microcosmic properties of HfO2 optical thin films

Microstructure Optimization and Optical and Interfacial Properties Modulation of Sputtering-Derived Hfo2 Thin Films by Tio2 Incorporation

Influence of Laser Conditioning on Defects of Hfo2 Monolayer Films

Annealing Temperature Dependent Microstructure and Optical Properties of HfxTi1-xO2 Thin Films

Modulation of Microstructure and Optical Properties of Anti-Reflection HfO 2 Films by Sputtering Power and O 2 /ar Flow Ratio

Laser-induced Damage Threshold of Hafnia Thin Films with Chemical Method

Mechanism of annealing effect on damage threshold enhancement of HfO2 films in vacuum

Effect of Heat Treatment on Properties of HfO2 Film Deposited by Ion-Beam Sputtering

Study of Laser Conditioning of Optical Coatings with Small Laser Spot Scanning

Influence of Laser Irradiating Energy on Optical Properties and Morphology of Tio2 Films

Annealing behaviors of structural, interfacial and optical properties of HfO 2 thin films prepared by plasma assisted reactive pulsed laser deposition

Effect of Substrate′s Crystalline Structure on Crystalline and Mechanical Properties of HfO2Thin Films

Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique

Influence of ion beam cleaning on properties of HfO 2 thin films

Effect of Laser Conditioning on Surface Modification and Laser Damage Resistance of SiO2 Antireflection Film

Investigation on the Laser-induced Damage Morphology of HfO2/SiO2 Antireflection Films

Contaminant-free Layer-by-layer Annealing to Improve the Properties of HfO2/SiO2 Optical Films for the Fs Laser

Influence of the deposition method on the laser induced damage threshold of HfO2 thin films

Laser-conditioning Mechanism of ZrO2/SiO2 HR Films with Fitting Damage Probability Curves of Laser-Induced Damage

Laser conditioning technology of optics

Effect of annealing on the properties of plasma-enhanced atomic layer deposition grown HfO 2 coatings for ultraviolet laser applications