Heterostructure films of SiO$_2$ and HfO$_2$ for high power laser optics prepared by plasma-enhanced atomic layer deposition
Shawon Alam,Pallabi Paul,Vivek Beladiya,Olaf Stenzel,Marcus Trost,Steffen Wilbrandt,Sven Schroeder,Gabor Matthaeus,Stefan Nolte,Sebastian Riese,Felix Otto,Torsten Fritz,Alexander Gottwald,Adriana Szeghalmi
DOI: https://doi.org/10.48550/arXiv.2212.08430
2022-12-16
Abstract:Absorption losses and laser-induced damage threshold (LIDT) are considered as the major constraint for the development of optical coatings for high-power laser optics. Such coatings require paramount properties like low losses due to optical absorption, high mechanical stability, and enhanced damage resistance to withstand high-intensity laser pulses. In this work, heterostructure films were developed by the intermixing of SiO$_2$ and HfO$_2$ using plasma-enhanced atomic layer deposition (PEALD) technique. Thin film characterization techniques such as spectroscopic ellipsometry, spectrophotometry, substrate curvature measurements, x-ray reflectivity, and Fourier transform infrared spectroscopy were employed for extracting optical constants, spectral inter-pretation, residual stress, layer formation, and functional groups present in the heterostructures, respectively. These heterostructures demonstrate tunable refractive index, bandgap, and improved optical losses and LIDT properties. The films were incorporated into antireflection coatings (multilayer stacks and graded index coatings) and the LIDT was determined at 355 nm wavelength by the R-on-1 method. Optical absorptions at the reported wavelengths were characterized using photothermal common-path interferometry and laser-induced deflection techniques.
Optics,Applied Physics