Abstract:HfO 2 has allured the significant attention on account of its chemical and thermal stability, large bandgap value, high dielectric constant and refractive index, good transmittance values in ultraviolet and infrared bands establish it as a significant candidate for resistive switching oxide and optical materials. In the present work the effect of Ag ion beam with 120 MeV high energy treatment of HfO 2 ALD grown thin films with thickness 40 nm is examined at distinct ion fluence from 1E12 to 1E13 ions/cm 2 . The present work reports the influence of 120 MeV Ag ion beam irradiation on the optical, structural and morphological characteristics of thin films grown by ALD method on glass and silicon substrate. The Tauc plots have been used to calculate the optical bandgap of films give the details of structure of films on account of slope of the plot is associated with the degree of the order in the network of bond. The SRIM simulation has been explored for the study of electronic and nuclear energy loss takes place in the samples. Structural analysis of pristine and ion beam irradiated thin films were studied by the X-ray diffraction technique. The effect of ion beam irradiation on the surface morphology were studied by the Atomic Force Microscopy (AFM), reveals that grain size rely on the variation takes place in the ion beam fluence. The ion beam causes surface state and interstitial defects in thin films samples as remarked by the Photoluminescence characterization method. Additionally, the RBS was used for the calculation of thickness of films.

Influence of ion beam cleaning on properties of HfO 2 thin films

High Laser-Induced Damage Threshold HfO2 Films Prepared by Ion-Assisted Electron Beam Evaporation

The Application of Ion Beam Cleaning on the Laser Films

Influence of the deposition method on the laser induced damage threshold of HfO2 thin films

Laser-induced Damage Threshold of Hafnia Thin Films with Chemical Method

The Effects of Ion Cleaning on the Roughness of Substrates and Laser Induced Damage Thresholds of Films

Study on Absorbance and Laser Damage Threshold of HfO2 Films Prepared by Ion-Assisted Reaction Deposition

Influence mechanism of laser conditioning on the microcosmic properties of HfO2 optical thin films

Investigation on the Laser-induced Damage Morphology of HfO2/SiO2 Antireflection Films

Energy Band Properties of Hafnium Oxide Thin Films Fabricated by Ion Beam Sputtering Technique

Influence of Laser Conditioning on Defects of Hfo2 Monolayer Films

LIDT of HfO 2 /sio 2 HR Films by Different Test Modes at 1064nm and 532Nm

Effect of Oxygen Flow on the Optical Properties of Hafnium Oxide Thin Films by Dual-Ion Beam Sputtering Deposition

Effect of Heat Treatment on Properties of HfO2 Film Deposited by Ion-Beam Sputtering

Modulation of Microstructure and Optical Properties of Anti-Reflection HfO 2 Films by Sputtering Power and O 2 /ar Flow Ratio

Influence of Dry Etching on the Properties of SiO2 and HfO2 Single Layers.

Comparison of laser induced damage at 1064 nm and 532 nm to high-reflective film fabricated by electron beam evaporation

Study of HfO2 Thin Films Prepared by Electron Beam Evaporation

Aps Bias Voltage On Properties Of Hfo2 Laser Films Deposited By Reactive Plasma Ion Assisted Electron Evaporation

120 MeV Ag high energy irradiation effects in physical and chemical properties of ALD grown HfO2 thin films and their applications