Abstract:Titanium dioxide films were deposited on silicon substrates from oxygen/titanium tetraisopropoxide inductively coupled radiofrequency plasmas in a helicon reactor operated at low temperature (<150°C) and low pressure (0.4Pa). The effect of the ion energy (Ei), varied in the 15–175eV range, on the morphology, microstructure and optical properties of the films is investigated. Scanning electron microscopy (SEM) shows that at low energy (Ei=15eV), the film exhibits a columnar morphology consisting of a bottom dense layer, an intermediate gradient layer and a top roughness layer. Increasing the ion energy results in more homogeneous films along the growth direction as confirmed by the in-situ kinetic ellipsometry measurements and post deposition spectroscopic ellipsometry data analysis. In addition, the atomic force microscopy (AFM) measurements reveal that the film top surface becomes smoother as Ei is increased. X-ray diffraction (XRD) diagrams show that only anatase is identified in the film deposited at 15eV, whereas the complete phase transformation from anatase to rutile occurs at Ei=75eV. These results are in good agreement with the Fourier transform infrared spectroscopy (FTIR) spectra which also show that the hydroxyl groups absorbed in the films deposited at 15eV, are greatly decreased for Ei≥45eV. Suitable structural models combined with the Tauc–Lorentz dispersion law have been found to accurately fit the spectroscopic ellipsometry experimental data. The results in good agreement with SEM and AFM measurements are also consistent with the structural properties evidenced by XRD and FTIR. The refractive index (n) can be increased significantly by increasing the ion energy from 15eV to 75eV, reaching a value of 2.49 at 1.96eV. Upon increasing the ion energy above 75eV n is shown to decrease due to micropores which are formed in the films.

120 MeV Ag high energy irradiation effects in physical and chemical properties of ALD grown HfO2 thin films and their applications

Low energy Xe ion beam engineering in optical, structural and morphological properties of hafnium oxide thin films grown by atomic layer deposition technique

Modulation of the structural and optical properties of sputtering-derived HfO2 films by deposition power

Microstructure Optimization and Optical and Interfacial Properties Modulation of Sputtering-Derived Hfo2 Thin Films by Tio2 Incorporation

Optical Properties of Al 2 O 3 Thin Film Fabricated by Atomic Layer Deposition

Role of Carrier Concentration in Swift Heavy Ion Irradiation Induced Surface Modifications

Annealing Temperature Dependence on the Structural and Optical Properties of Sputtering-Grown High-K HfO2 Gate Dielectrics

Influence of Swift Heavy Ion Beam Irradiation on Optical, Structural, and Surface Morphological Properties of WO3 Thin Films Grown by RF Sputtering Method

Structural, Optical and Electrical Properties of HfO2 Thin Films Deposited at Low-Temperature Using Plasma-Enhanced Atomic Layer Deposition

Investigation of HfO2 Thin Films on Si by X-ray Photoelectron Spectroscopy, Rutherford Backscattering, Grazing Incidence X-ray Diffraction and Variable Angle Spectroscopic Ellipsometry

Crystallinity Effect on Electrical Properties of PEALD–HfO2 Thin Films Prepared by Different Substrate Temperatures

Annealing behaviors of structural, interfacial and optical properties of HfO 2 thin films prepared by plasma assisted reactive pulsed laser deposition

Effect of low energy (keV) ion irradiation on structural, optical and morphological properties of SnO 2 –TiO 2 nanocomposite thin films

Atomic layer deposition of Al2O3 and HfO2 for high power laser application

Structural, optical and phonon properties of hafnium oxynitride thin films synthesized using plasma-enhanced atomic layer deposition

Effect Of Al Addition On The Microstructure And Electronic Structure Of Hfo2 Film

The enhancement in microstructure, optical and electromagnetic shielding properties of Al-doped Ag thin films by annealing treatment

Effect of low energy (keV) ion irradiation on structural, optical and morphological properties of SnO2–TiO2 nanocomposite thin films

Effect of ion bombardment on the structural and optical properties of TiO 2 thin films deposited from oxygen/titanium tetraisopropoxide inductively coupled plasma

Effect of Oxygen Flow on the Optical Properties of Hafnium Oxide Thin Films by Dual-Ion Beam Sputtering Deposition

Lanthanum doped hafnium oxide thin films deposited on a lateral high aspect ratio structure using atomic layer deposition: A comparative study of surface composition and uniformity using x-ray photoelectron spectroscopy and time-of-flight secondary ion mass spectrometry