DC and RF Modeling of Si Schottky Diodes

Jiangyi LIU,Yang TANG,Ding WANG,Yan? WANG
DOI: https://doi.org/10.3969/j.issn.1005-9490.2017.01.002
2017-01-01
Abstract:A unified model is proposed by piecewise parameter extraction method for CoSi2-Si Schottky diodes in SMIC 130nm CMOS process applicable to both DC and RF characteristics. For the DC characteristics, interfacial barrier inhomogeneity effect, high injection effect and tunneling effect are considered besides thermionic emission effect. Substrate parasitic effect and metal parasitic effect are specially taken into account in RF characteristics on the basis of the DC model. The DC fitting error of the model is 1. 26%, and the average fitting errors of capacitance and resistance characteristics are respectively 3.16% and 2.25% in the whole frequency range(1 GHz~67 GHz). To our knowledge,this is for the first time such a unified model for CoSi2-Si Schottky diode considering DC and RF charac-teristics together with corresponding extraction procedure is proposed.
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