Investigation of Voids in Large Size CdS Single Crystals Grown by PVT Method

Xiaoqing Huo,Hongjuan Cheng,Kai Yu,Kun Zhao,Jian Wang,Lei Jin
DOI: https://doi.org/10.13290/j.cnki.bdtjs.2019.11.013
2019-01-01
Abstract:CdS single crystal is a kind of Ⅱ-Ⅵ direct band gap semiconductor materials with excellent electrical and optical properties.It has attracted more and more attention in recent years.However,void defects are easily to be formed in these large size CdS single crystals during the growth process.CdS quality is difficultto control,which makes the electrical properties of CdS crystals unstable and restricts their practical applications.CdS single crystals with the size of 55 mm× 15 mm were successfully grown by physical vapor transport (PVT) method.The process and causes of voids formation in the CdS single crystal were analyzed and studied.Furthermore,an improved CdS crystal growth technology was proposed,which reduces the density of the void defects and improves the quality of the CdS crystals.At 25-300 K,Hall mobility,carrier concentration and specific resistivity of the large size CdS single crystal grown by the improved growth method were tested,and the mobility is up to 7 000 cm2 · V-1 · s-1,which provides important data support for the practical application of large size CdS single crystals in devices.
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