Optimization of Photoelectron In-Situ Sensing Device in FD-SOI

J. Liu,K. Xiao,J. -N. Deng,A. Zaslavsky,S. Cristoloveanu,Fy. Liu,J. Wan
DOI: https://doi.org/10.1109/jeds.2020.3048721
2021-01-01
IEEE Journal of the Electron Devices Society
Abstract:This article presents the optimization of a one-transistor active pixel sensor (1T-APS), known as the photoelectron in-situ sensing device (PISD) built in a fully-depleted silicon-on-insulator (FD-SOI) substrate. By employing TCAD simulation, we develop a physics-based model and systematically investigate the impact of six key parameters - gate oxide thickness, buried oxide layer, top Si layer, gate length, length of active region, and substrate doping - on the device's sensitivity and sensing range. Our comprehensive study provides guidance on the design of the PISD with the highest performance.
What problem does this paper attempt to address?