Doping Effect in Si Nanocrystals/SiO2 Multilayers

Dongke Li,Peng Lu,Minqing Qian,Jun Xu,Wei Li,Kunji Chen
DOI: https://doi.org/10.1088/1742-6596/864/1/012012
2017-01-01
Abstract:Doping in Si nano-crystals (Si NCs) is currently a great challenge to develop the high-performance nano-devices. Here, we fabricated P-doped Si NCs by PECVD in Si/SiO2 multilayered structures after annealing at high temperature. It is demonstrated experimentally that P dopants can be incorporated into Si NCs substitutionally. Furthermore, we found that the photoluminescence properties of Si NCs can be drastically modified by P doping in Si NCs/SiO2 multilayers with the ultra-small size. A subband light emission centred at 1200nm is observed, which can be ascribed to the radiative recombination via the P-induced deep level in the gap of the Si NCs. Interestingly, it is also found that the subband emission can be enhanced obviously by B and P co-doping. Our results suggest that doping plays an important role in the electronic structures and optoelectronic characteristics of Si NCs, which provide a new route to realize the Si NCs-based optical and electronical devices.
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