Abstract:Effects of boron and phosphorus doping on the structural, electrical, and optical properties of silicon nanocrystals in superlattice thin films were investigated. Silicon nanocrystals were fabricated via magnetron sputtering of stoichiometric silicon rich oxide and silicon dioxide bilayers followed by high temperature annealing at 1100 degrees Celsius. The characterization techniques used include: high-resolution transmission electron microscopy with energy filtering, grazing incidence x-ray diffraction, Raman, photoluminescence, and photothermal deflection spectroscopy, as well as electrical measurements. Results showed that phosphorus doping causes the loss of the bilayer structure and an increase in the average size of the silicon nanocrystals due to softening of the silicon dioxide matrix during post-sputter annealing. The result was a decrease in quantum confinement and a redshift in photoluminescence spectrum with an absorption profile similar to crystalline silicon. The undoped (intrinsic) sample maintained its bilayer structure and displayed stronger quantum confinement with higher photoluminescence peak energy and higher absorption coefficient. In-between, the boron doped sample was more similar structurally to the intrinsic sample, although merging between bilayers resulted in an extensive silicon nanocrystalline network. Optically, it displayed different effects due to photoluminescence quenching and free carrier absorption. Finally, both doped samples exhibited a decrease in electrical resistivity.

Doping silicon nanocrystals with boron and phosphorus

Boron- and Phosphorus-Hyperdoped Silicon Nanocrystals

First-Principles Study of 2.2 Nm Silicon Nanocrystals Doped with Boron

First Principles Study on Phosphorus or Boron Doping in Si Nanocrystals with Various Sizes Embedded in SiO2 Matrix

Density Functional Theory Study on the B Doping and B/P Codoping of Si Nanocrystals Embedded in SiO2

Lightly boron and phosphorus co-doped silicon nanocrystals

Doping Efficiency, Dopant Location, and Oxidation of Si Nanocrystals

The Location and Doping Effect of Boron in Si Nanocrystals Embedded Silicon Oxide Film

Ab Initio Molecular Dynamics Simulation Study on Phosphorus/Boron Co-Doped Si Nanocrystals/SiO2 Core/Shell Structures

Doping Si Nanocrystals Embedded in Sio2 with P in the Framework of Density Functional Theory

Direct observation of the distribution of impurity in phosphorous/boron co-doped Si nanocrystals

The Phosphorus and Boron Co-Doping Behaviors at Nanoscale in Si Nanocrystals/Sio2 Multilayers

Size‐Dependent Structures and Optical Absorption of Boron‐Hyperdoped Silicon Nanocrystals

Comparative study on the localized surface plasmon resonance of boron- and phosphorus-doped silicon nanocrystals.

Critical role of dopant location for P-doped Si nanocrystals

Properties of silicon nanocrystals with boron and phosphorus doping fabricated via silicon rich oxide and silicon dioxide bilayers

Doped Silicon Nanoparticles Synthesized by Nonthermal Plasma

Atomic-scale study on the dopant distribution in phosphorus and boron-doped Si nanocrystals/SiO2 multilayers

Size-dependent Phosphorus Doping Effect in Nanocrystalline-Si-based Multilayers

Ligand-Free, Colloidal, and Plasmonic Silicon Nanocrystals Heavily Doped with Boron

Doping Effect in Si Nanocrystals/SiO2 Multilayers