Effects of X-ray Irradiation on Vertical GaN-on-GaN Schottky Barrier Diode Biased on the Applied Voltage

Xiao-Xi Li,Jin-Xin Chen,Wei Huang,Zhigang Ji,Zhi-Hong Feng,Su-Zhen Wu,Zhi-Qiang Xiao,Hong-Liang Lu
DOI: https://doi.org/10.1109/ipfa49335.2020.9261085
2020-01-01
Abstract:The radiation characteristics of vertical GaN-on-GaN Schottky barrier diodes (SBD) by the bias of +0.8 V and -5.0 V have been investigated with four different doses of the total ionizing dose irradiation for the first time. The off-state current decreases by ~99 % for X-ray doses of 80 krad due to the trapping of electrons at the nitrogen vacancies and the barrier height increases. The off-state current for X-ray doses above 160 krad increases owing to the effects of X-ray radiation induced carrier generation over occupation of defect sites. The leakage current still reduces compared with that of the pristine device even after 400 krad X-ray doses. Moreover, the effect of X-ray irradiation on the physical characteristics has been analysed by X-ray diffraction (XRD), Micro-raman, and photoluminescence (PL) measurements. This study provides an evidence for improved performance of GaN SBD devices by using a certain dosage treatment of X-ray.
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