Nonvolatile Resistive Switching in Co Doped Amorphous Carbon Film

Shuwei Zhang,Jiawei Zhou,Dian Zhang,Bing Ren,Lin Wang,Jian Huang,Linjun Wang
DOI: https://doi.org/10.1016/j.vacuum.2015.12.025
IF: 4
2016-01-01
Vacuum
Abstract:Co-doped amorphous carbon films were prepared by direct current magnetron sputtering technique with a composite target (Co:4 at%, C:96 at%). Reliable and reproducible bipolar resistive switching behaviors were observed in Al/alpha t-C:Co/FTO structure memory cells with an on/off ratio about 25, and retention time >10(5) s. The conduction mechanisms of LRS and HRS were supposed to be attributed to Ohmic behavior and the SCLC, respectively. The observed resistive switching phenomena might originate from the formation/rupture of metal filaments due to the diffusion of Co in the film under an electric field. (C) 2016 Elsevier Ltd. All rights reserved.
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