Abstract:Self‐organization driven by femtosecond‐laser texturing of crystalline Si in oxidation‐preventing methanol allows to create diverse anti‐reflective surface morphologies controlled by laser processing parameters. Electromagnetic processes dominating at initial steps of the progressive grating‐type morphology evolution define the onset of the hydrodynamic processes and resulting random spiky morphology upon subsequent multi‐pulse exposure. Upon systematic studies of femtosecond‐laser processing of monocrystalline Si in oxidation‐preventing methanol, it is shown that the electromagnetic processes dominating at initial steps of the progressive morphology evolution define the onset of the hydrodynamic processes and morphology upon subsequent multi‐pulse exposure. Under promoted exposure quasi‐regular subwavelength laser‐induced periodic surface structures (LIPSSs) are justified to evolve through the template‐assisted development of the Rayleigh‐Plateau hydrodynamic instability in the molten ridges forming quasi‐regular patterns with a supra‐wavelength periodicity and preferential alignment along polarization direction of the incident light. Subsequent exposure promotes fusion‐assisted morphology rearrangement resulting in a spiky surface with random orientation, yet constant inter‐structure distance correlated with initial LIPSS periodicity. Along with the insight onto the physical picture driving the morphology evolution and supra‐wavelength nanostructure formation, this experiments also demonstrated that resulting quasi‐regular and random spiky morphology can be tailored by the intensity/polarization distribution of incident laser beam allowing on‐demand surface nanotexturing with diverse hierarchical surface morphologies exhibiting reduced reflectivity at visible and shortwave‐IR wavelengths. Finally, the practical attractiveness of the suggested approach for improving near‐IR photoresponse and expanding operation spectral range of vertical p‐n junction Si photodetector operating under room temperature and zero‐bias conditions via single‐step annealing‐free nanopatterning is highlighted.

Heat accumulation effect existing in silicon substrate by femtosecond laser irradiation on antireflection performance

Hierarchical Micro/Nanostructures with Anti-Reflection and Superhydrophobicity on the Silicon Surface Fabricated by Femtosecond Laser

Combined Continuum-Atomistic Modeling of Ultrashort-Pulsed Laser Irradiation of Silicon

Characterization of anti-reflection structures fabricated via laser micro/nano-processing

Comparison study of the femtosecond laser-induced surface structures on silicon at an elevated temperature.

Heat accumulation effect during CO2 laser processing of fused silica optics

Investigation of mechanism and surface morphology on the femtosecond laser ablation of silicon nitride under different auxiliary processing environments

Femtosecond laser fabrication of silicon surface microstructures for enhanced infrared radiation under electric drive

Effects of Parameters in Femtosecond Laser Micromachining on Ablation of Silicon

Femtosecond-Laser-Ablation Dynamics in Silicon Revealed by Transient Reflectivity Change

Liquid-assisted laser nanotexturing of silicon: onset of hydrodynamic processes regulated by laser-induced periodic surface structures

Optimization of Porous Silicon Structure As Antireflective Material

The influence of ultrafast temporal energy regulation on the morphology of Si surfaces through femtosecond double pulse laser irradiation

Liquid‐Assisted Laser Nanotexturing of Silicon: Onset of Hydrodynamic Processes Regulated by Laser‐Induced Periodic Surface Structures

Femtosecond laser modification of silicon carbide substrates and its influence on CMP process

Deepening of nanograting structures on Si by a two-step laser spatial-selective amorphization strategy combined with chemical etching

Effects of Black Silicon Surface Morphology Induced by a Femtosecond Laser on Absorptance and Photoelectric Response Efficiency

Great enhancement of infrared light absorption of silicon surface-structured by femtosecond laser pulses in N2 ambient

Progress on Ultrafast Laser Fabricating Metal Surface Micro-Nano Antireflection Structures

Fabrication of Black Silicon with Thermostable Infrared Absorption by Femtosecond Laser

Remote and Rapid Micromachining of Broadband Low-Reflectivity Black Silicon Surfaces by Femtosecond Laser Filaments.